|저자||Yohan Choi, Moon-kyu Sung, Sang Hyun Lee, Jee-Hyong Lee, Jin-Hong Park, Ji-Hyun Choi, Sung-Yong Moon, Sung-Yoon Choi, and Woo-Sung Han|
|학회명||The International Society for Optical Engineering|
|학회명 (약자)||SPIE 2005|
Defect-free mask is a dream of mask makers. Repair technology  that removes defects on Att. PSM is getting more attentions than ever. Therefore the fast and precise verification of repaired results is highly required. Most confirmation methods are carried out by using the inspection system because it is faster than AIMS to verify the repaired results. However, the accuracy of the verification using the inspection system cannot be compared to it with AIMS in the view of printability. In this paper, the results of optical simulation using top-down repair image are compared with those of AIMS for rapid confirmation of repaired results with competitive accuracy. Also, neural network which can compute the complex non-linear relationships easily are used to increase the accuracy of repair simulation.